Selective Wet Removal of Hf-Based Layers and Post-Dry Etch Residues in High-k and Metal Gate StacksMartine Claes, Stefan De Gendt, Harald Kraus et al.|Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena|2005Cited by 1
Integration of high-k gate dielectrics - Wet etch, cleaning and surface conditioningStefan De Gendt, Marc Heyns, S. Beckx et al.|Unknown|2004Cited by 0
Selective wet removal of Hf-based layers and post-dry etch residues high-k and metal gateMartine Claes, Stefan De Gendt, Vasile Paraschiv et al.|Unknown|2004Cited by 0