Polycrystalline Si optimization for 45nm node Ni-FUSI gate

Xiaodong Shi(Beijing Anding Hospital), L. Daté(Imec the Netherlands), S. Brus(University of Liège), Marc Schaekers(IMEC), Alain Moussa(IMEC), A. Rothschild(IMEC), Olivier Richard(IMEC), J.-L. Everaert(IMEC), Erik Rosseel(IMEC)
Unknown
January 1, 2006
10.1109/icsict.2006.306267
Cited by 1

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