Tailoring switching and endurance / retention reliability characteristics of HfO<inf>2</inf> / Hf RRAM with Ti, Al, Si dopants

Y. Y. Chen(University of Antwerp), M. Jurczak(IMEC), A. Redolfi(IMEC), D. Crotti(IMEC), A. Fantini(IMEC), Attilio Belmonte(IMEC), Masanori Komura(IMEC), Qiyuan Xie(ASM International (Belgium)), R. Degraeve(IMEC), B. Govoreanu(IMEC), Geoffrey Pourtois(IMEC), L. Zhang(IMEC), R. Roelofs(ASM International (Belgium)), Jan Willem Maes(ASM International (Belgium)), L. Goux(IMEC), Sergiu Clima(IMEC)
Unknown
June 1, 2014
10.1109/vlsit.2014.6894403
Cited by 32

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