Selective Wet Removal of Hf-Based Layers and Post-Dry Etch Residues in High-k and Metal Gate Stacks
Martine Claes(Imec the Netherlands), Stefan De Gendt(Imec the Netherlands), Sylvain Garaud, Rita Vos(IMEC), Vasile Paraschiv(IMEC), M. Demand(IMEC), Harald Kraus, S. Beckx(Imec the Netherlands), Werner Boullart(IMEC), James Snow(IMEC), W. Deweerd(IMEC)
Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena
April 1, 2005
Cited by 1
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