Heated implantation with amorphous Carbon CMOS mask for scaled FinFETs
M. Togo(IMEC), Aaron Thean(National University of Singapore), J. W. Lee(IMEC), S. Brus(University of Liège), Wilfried Vandervorst(Imec the Netherlands), G. Zschätzsch(KU Leuven), Geert Hellings(IMEC), Naoto Horiguchi(IMEC), Harold Dekkers(IMEC), Ludovic Godet(Nantes Université), G. Boccardi(IMEC), S. E. Altamirano, B. Colombeau(University of Surrey), R. Ritzenthaler(IMEC), Patrick Martin(Silicon Labs (United States)), Y. Sasaki(IMEC), Fareen Adeni Khaja(Silicon Labs (United States)), G. Mannaert(IMEC)
Symposium on VLSI Technology
June 11, 2013
Cited by 7
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