Intrinsic Tailing of Resistive States Distributions in Amorphous HfO<sub><italic>x</italic></sub> and TaO<sub><italic>x</italic></sub> Based Resistive Random Access Memories

Sergiu Clima(IMEC), M. Jurczak(IMEC), A. Fantini(IMEC), Y. Y. Chen(University of Antwerp), R. Degraeve(IMEC), B. Govoreanu(IMEC), Geoffrey Pourtois(IMEC), L. Goux(IMEC)
IEEE Electron Device Letters
June 23, 2015
10.1109/led.2015.2448731
Cited by 57

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