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Characterization of interface state density of three-dimensional Si nanostructure by charge pumping measurementChunmeng Dou, Hiroshi Iwai, Tomoya Shoji et al.|Microelectronics Reliability|2013Cited by 5
Influence of Electrode Materials on CeO<sub>x</sub> Based Resistive SwitchingS. Kano, Hiroshi Iwai, Chunmeng Dou et al.|ECS Transactions|2012Cited by 1
Evaluation of Interfacial State Density of MOS Capacitor with Three-Dimensional Channel by Conductance MethodWei Li, Hiroshi Iwai, Kazuhiro Nakajima et al.|ECS Transactions|2012Cited by 0
Determination of oxide traps distribution in high-k/InGaAs MOS capacitor by capacitance-voltage measurementChun Meng Dou, H Iwai, Chunmeng Dou et al.|Institutional Repositories DataBase (IRDB)|2014Cited by 0