Determination of oxide traps distribution in high-k/InGaAs MOS capacitor by capacitance-voltage measurement
Chun Meng Dou, H Iwai, 信之 杉井, Chunmeng Dou(Chinese Academy of Sciences), 好則 片岡, Kuniyuki Kakushima, Yoshinori Kataoka(Tokyo Institute of Technology), KAZUO TSUTSUI, 邦之 角嶋, Akira Nishiyama, Hitoshi Wakabayashi, 一生 筒井, 整 若林, Kenji Natori, 研二 名取, 彰 西山, Nobuyuki Sugii(Tokyo Institute of Technology)
Institutional Repositories DataBase (IRDB)
February 1, 2014
Cited by 0
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