Comparative Study of Self-Sputtering Effects of Different Boron-Based Low-Energy Doping TechniquesShu Qin, Allen McTeer, K. Zhuang et al.|IEEE Transactions on Plasma Science|2009Cited by 12
Ambient-controlled scanning spreading resistance microscopy measurement and modelingShu Qin, Allen McTeer, Yongjun Hu et al.|Applied Physics Letters|2013Cited by 10
Direct Measurements of Self-Sputtering, Swelling, and Deposition Effects of N-Type Low-Energy Ion ImplantationsShu Qin, Shi-Feng Lu, Kent Zhuang et al.|IEEE Transactions on Plasma Science|2009Cited by 7
Two-Dimensional Cross-Sectional Doping Profile Study of Low Energy High Dose Ion Implantations Using High Vacuum Scanning Spreading Resistance Microscopy (HV-SSRM) and Electron HolographyShu Qin, Yongjun Hu, Allen McTeer et al.|AIP conference proceedings|2011Cited by 2
Plasma doping two-dimensional characterization using low energy x-ray emission spectroscopy and full wafer secondary ion mass spectrometry/angle-resolved x-ray electron spectroscopy techniquesShu Qin, Shi-Feng Lu, Allen McTeer et al.|Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena|2010Cited by 1