Comparative Study of Self-Sputtering Effects of Different Boron-Based Low-Energy Doping Techniques

Shu Qin(Micron (United States)), Allen McTeer(Micron (United States)), Yongjun Hu(South China Normal University), Shi-Feng Lu(Micron (United States)), K. Zhuang(Micron (United States))
IEEE Transactions on Plasma Science
August 11, 2009
Cited by 12


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