PLAD (Plasma Doping) on 22nm Technology Node and Beyond - Evolutionary and/or RevolutionaryShu Qin, Allen McTeer, Yongjun Hu|Unknown|2012Cited by 19
Study of Carrier Mobility of Low-Energy High-Dose Ion ImplantationsShu Qin, Allen McTeer, Simon A. Prussin et al.|IEEE Transactions on Plasma Science|2010Cited by 15
Study of Low-Energy Doping Processes Using Continuous Anodic Oxidation Technique/Differential Hall Effect MeasurementsShu Qin, Allen McTeer, Yongjun Hu et al.|IEEE Transactions on Plasma Science|2009Cited by 13
Comparative Study of Self-Sputtering Effects of Different Boron-Based Low-Energy Doping TechniquesShu Qin, Allen McTeer, Yongjun Hu et al.|IEEE Transactions on Plasma Science|2009Cited by 12
Co-gas impact of B2H6 plasma diluted with helium on the plasma doping process in a pulsed glow-discharge systemShu Qin, Yongjun Hu, Allen McTeer|Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena|2005Cited by 11