Plasma doping two-dimensional characterization using low energy x-ray emission spectroscopy and full wafer secondary ion mass spectrometry/angle-resolved x-ray electron spectroscopy techniques
Shu Qin(Micron (United States)), Shi-Feng Lu(Micron (United States)), Allen McTeer(Micron (United States)), Wendy Morinville(Micron (United States)), Kent Zhuang(Micron (United States)), Yongjun Hu(South China Normal University), F. Fabreguette(Micron (United States))
Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena
January 1, 2010
Cited by 1
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