Two-Dimensional Cross-Sectional Doping Profile Study of Low Energy High Dose Ion Implantations Using High Vacuum Scanning Spreading Resistance Microscopy (HV-SSRM) and Electron Holography
Shu Qin(Micron (United States)), Jaydip Guha(Micron (United States)), Pierre Eyben(Imec the Netherlands), David Fillmore(Micron (United States)), Danielle Vanhaeren(IMEC), Yongjun Hu(South China Normal University), R. Burke(Micron (United States)), Shi-Feng Lu(Micron (United States)), Allen McTeer(Micron (United States)), Wilfred Vandervorst
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