Selective epitaxial Si/SiGe growth for<i>V</i><sub>T</sub>shift adjustment in high<i>k</i>pMOS devices
Roger Loo(IMEC), Matty Caymax(IMEC), S. Jakschik(IMEC), A. Inoue(Panasonic (Japan)), G.S. Lujan(IMEC), S. Hyun, Haruyuki Sorada(Panasonic (Japan)), T. Hoffmann(IMEC), B C Lee(Samsung (South Korea))
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