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Passivation of Ge(100)∕GeO[sub 2]∕high-κ Gate Stacks Using Thermal Oxide TreatmentsFlorence Bellenger, Marc Heyns, Michel Houssa et al.|Journal of The Electrochemical Society|2007Cited by 123
Germanium for advanced CMOS anno 2009: a SWOT analysisMatty Caymax, Marc Heyns, G. Wang et al.|Unknown|2009Cited by 60
Interface control of high-k gate dielectrics on GeMatty Caymax, Sven Van Elshocht, Michel Houssa et al.|Applied Surface Science|2008Cited by 58
High FET Performance for a Future CMOS $\hbox{GeO}_{2}$ -Based TechnologyFlorence Bellenger, Marc Heyns, Brice De Jaeger et al.|IEEE Electron Device Letters|2010Cited by 51