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Process control & integration options of RMG technology for aggressively scaled devicesA. Veloso, Naoto Horiguchi, Yuichi Higuchi et al.|Unknown|2012Cited by 21
Highly scalable effective work function engineering approach for multi-V T modulation of planar and FinFET-based RMG high-k last devices for (Sub-)22nm nodesA. Veloso, Naoto Horiguchi, G. Boccardi et al.|Unknown|2013Cited by 9