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Atomic layer deposition of hafnium oxide on germanium substratesAnnelies Delabie, Wilman Tsai, Riikka L. Puurunen et al.|Journal of Applied Physics|2005Cited by 101
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Performance comparison of sub 1 nm sputtered TiN/HfO/sub 2/ nMOS and pMOSFETsWu‐ting Tsai, Marc Heyns, L.-Å. Ragnarsson et al.|Unknown|2004Cited by 34
The future of high-K on pure germanium and its importance for Ge CMOSMarc Meuris, Marc Heyns, Annelies Delabie et al.|Materials Science in Semiconductor Processing|2004Cited by 18