Atomic layer deposition of hafnium oxide on germanium substrates
Annelies Delabie(IMEC), Wilman Tsai(Intel (United States)), Bart Onsia, Chao Zhao, Hidde H. Brongersma, Thierry Conard(IMEC), Eric Garfunkel(Rutgers, The State University of New Jersey), Wilfried Vandervorst(Imec the Netherlands), Matty Caymax(IMEC), Marc Heyns(IMEC), Bert Brijs(IMEC), M. Viitanen, Lyudmila V. Goncharova(Rutgers, The State University of New Jersey), Marc Meuris(IMEC), Torgny Gustafsson(Rutgers, The State University of New Jersey), Riikka L. Puurunen(Aalto University), M. de Ridder(Philips (India)), Olivier Richard(IMEC)
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