Impact of work function metal stacks on the performance and reliability of multi-V RMG CMOS technology
J. Franco(KU Leuven), B. Kaczer(IMEC), E. Dentoni Litta(IMEC), Hiroaki Arimura(IMEC), Naoto Horiguchi(IMEC), S. Brus(University of Liège), Kristof Croes(IMEC)
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