Reflective mask technologies and imaging results in soft x-ray projection lithographyD. M. Tennant, Alastair A. MacDowell, R. R. Freeman et al.|Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena|1991Cited by 23
Mask technologies for soft-x-ray projection lithography at 13 nmD. M. Tennant, O. R. Wood, Linus A. Fetter et al.|Applied Optics|1993Cited by 14