Metallorganic Chemical Vapor Deposition of Dysprosium Scandate High-k Layers Using mmp-Type Precursors

Sven Van Elshocht(Columbia University), Marc Heyns(IMEC), Paul Zimmerman(Intel (United States)), B. Seitzinger(Aixtron (Germany)), T. Witters(IMEC), Thierry Conard(IMEC), Matty Caymax(IMEC), Alain Moussa(IMEC), Alexis Franquet(IMEC), Mindaugas Lukosius(Leibniz Institute for High Performance Microelectronics), Christoph Adelmann(Imec the Netherlands), Bert Brijs(IMEC), Stefan De Gendt(Imec the Netherlands), Paul A. Williams(University of Iowa), P. Lehnen(IMEC), A. Abrutis(Vilnius University), C. Lohe(Aixtron (Germany)), Olivier Richard(IMEC)
Journal of The Electrochemical Society
January 1, 2006
10.1149/1.2220076
Cited by 19

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