A scalable Stacked Gate NOR/NAND Flash Technology compatible with high-k and metal gates for sub 45nm generations
Joeri De Vos(IMEC), Jeroen Van Houdt(Janssen (Belgium)), M. Demand(IMEC), L. Haspeslagh(IMEC), S. Beckx(Imec the Netherlands), K. Devriendt(IMEC), D. Wellekens(IMEC)
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