Properties and dynamic behavior of electron traps in HfO2/SiO2 stacks

Zhenyu Zhao(Liverpool John Moores University), Stefan De Gendt(Imec the Netherlands), G. Groeseneken(KU Leuven), J. F. Zhang(Liverpool John Moores University), R. Degraeve(IMEC), M. B. Zahid(IMEC)
Microelectronic Engineering
June 1, 2005
10.1016/j.mee.2005.04.028
Cited by 36

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