High Ge content SGOI substrates obtained by the Ge condensation technique: A template for growth of strained epitaxial Ge
Laurent Souriau(IMEC), Matty Caymax(IMEC), Francesca Clemente(University of Florence), Alain Moussa(IMEC), Bert Brijs(IMEC), V. Terzieva(IMEC), W. Vandervorst(IMEC), Marc Meuris(IMEC), Roger Loo(IMEC)
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