Understanding the impact of programming pulses and electrode materials on the endurance properties of scaled Ta<inf>2</inf>O<inf>5</inf> RRAM cells
C.Y. Chen(IMEC), M. Jurczak(IMEC), A. Redolfi(IMEC), A. Fantini(IMEC), R. Degraeve(IMEC), Y.Y. Chen(IMEC), Sergiu Clima(IMEC), L. Goux(IMEC), G. Groeseneken(KU Leuven)
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