Plasma doping and reduced crystalline damage for conformally doped fin field effect transistors
Jae Wook Lee(Korea Advanced Institute of Science and Technology), Aaron Thean(IMEC), S. Brus(University of Liège), M. Togo(IMEC), Naoto Horiguchi(IMEC), Geert Eneman(Research Foundation - Flanders), Y. Sasaki(IMEC), G. Boccardi(IMEC), R. Ritzenthaler(IMEC), Moon Ju Cho(IMEC), T. Chiarella(IMEC), G. Groeseneken(KU Leuven)
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