Electrical properties of thin SiON/Ta2O5 gate dielectric stacks
Michel Houssa(IMEC), B. Ogle(Advanced Micro Devices (United States)), Paul Mertens(IMEC), J. S. Jeon(Advanced Micro Devices (United States)), M. M. Heyns(IMEC), A. Halliyal(Advanced Micro Devices (United States)), R. Degraeve(IMEC)
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