Ni-based FUSI gates: CMOS Integration for 45nm node and beyondThomas Hoffmann, J. A. Kittl, A. Veloso et al.|Unknown|2006Cited by 16
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Low Power CMOS Featuring Dual Work Function FUSI on HfSiON and 17ps Inverter DelayThomas Hoffmann, S. Biesemans, A. Veloso et al.|Unknown|2006Cited by 4
Integration of tall triple-gate devices with inserted TaxNy gate in a 0.274µm2 6T-SRAM cell and advanced CMOS logic circuitsLiesbeth Witters, S. Biesemans, Nadine Collaert et al.|Unknown|2005Cited by 4