Scaling to Sub-1 nm Equivalent Oxide Thickness with Hafnium Oxide Deposited by Atomic Layer Deposition
Annelies Delabie(IMEC), Marc Heyns(IMEC), Thierry Conard(IMEC), Matty Caymax(IMEC), Bert Brijs(IMEC), Stefan De Gendt(Imec the Netherlands), Sven Van Elshocht(Columbia University), D.P. Brunco(Imec the Netherlands), Lars‐Åke Ragnarsson(IMEC), Erik Sleeckx(IMEC)
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