Erratum to “Comparison of the ZnO:Al films deposited in static and dynamic modes by reactive mid-frequency magnetron sputtering” [J. Crystal Growth 253 (2003) 117–128]
Ruijiang Hong(Kunming University of Science and Technology), G. Heide(Clausthal University of Technology), V. Sittinger(Fraunhofer Institute for Surface Engineering and Thin Films), Xin Jiang(Inner Mongolia University of Technology), Sheng Xu(Fraunhofer Institute for Surface Engineering and Thin Films), Wolfgang Werner(TU Wien), Bernd Szyszka(Fraunhofer Institute for Surface Engineering and Thin Films)
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