AlN Film Characteristics Deposited by Minimal Fab Reactive Sputtering Tool (2)Shuichi Noda, Shiro Hara, Ryuichiro Kamei et al.|The Japan Society of Applied Physics|2020Cited by 1
Formation of TiN Films Using Minimal Sputtering ToolShuichi Noda, Shiro Hara, Sommawan Khumpuang et al.|The Japan Society of Applied Physics|2018Cited by 0
Film Characteristics deposited by Minimal Fab TiN Reactive Sputtering Tool (2)Shuichi Noda, Shiro Hara, Kazuhiro Koga et al.|The Japan Society of Applied Physics|2019Cited by 0
A Study of Al Wiring and Al Gate with A Minimal Sputtering ToolShuichi Noda, Shiro Hara, Masashi Kase et al.|The Japan Society of Applied Physics|2021Cited by 0