Film Characteristics deposited by Minimal Fab TiN Reactive Sputtering Tool (2)

Shuichi Noda, Shiro Hara(National Institute of Advanced Industrial Science and Technology), Yuuki Yabuta, Ryuichiro Kamei, Sommawan Khumpuang, Kazumasa Nemoto, Naoko Yamamoto(Disco (japan)), Kazuhiro Koga

The Japan Society of Applied Physics

January 25, 2019

Cited by 0

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