Formation of TiN Films Using Minimal Sputtering ToolShuichi Noda, Shiro Hara, Hirohisa Tanaka et al.|The Japan Society of Applied Physics|2018Cited by 0
Film Characteristics deposited by Minimal Fab TiN Reactive Sputtering Tool (2)Shuichi Noda, Shiro Hara, Naoko Yamamoto et al.|The Japan Society of Applied Physics|2019Cited by 0