AlN Film Characteristics Deposited by Minimal Fab Reactive Sputtering Tool (2)

Shuichi Noda, Shiro Hara(National Institute of Advanced Industrial Science and Technology), Sommawan Khumpuang, Yuuki Yabuta, Ryuichiro Kamei, Naoko Yamamoto(Disco (japan))

The Japan Society of Applied Physics

January 28, 2020

Cited by 1

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