A novel self-aligned double patterning integrated with Ga+ focused ion beam milling for silicon nanowire definition
Andressa Macedo Rosa(Universidade Estadual de Campinas (UNICAMP)), J. A. Diniz(Universidade Estadual de Campinas (UNICAMP)), Alessandra Leonhardt(ASM International (Finland)), Marcos V. Puydinger dos Santos(Universidade Estadual de Campinas (UNICAMP)), Lucas Petersen Barbosa Lima(IMEC), Laís Oliveira de Souza(Universidade Estadual de Campinas (UNICAMP)), Leandro Tiago Manera(Universidade Estadual de Campinas (UNICAMP))
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