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20:1 projection soft x-ray lithography using trilevel resistT. E. Jewell, John H. Bruning, Marco Becker et al.|Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE|1990Cited by 14
Construction and test of phase zone plates for x-ray microscopyD. M. Tennant, Ján Greguš, E. L. Raab et al.|Optics Letters|1991Cited by 14