Defect repair for soft x-ray projection lithography masks

D. M. Tennant(University of Tennessee at Knoxville), O. R. Wood(AT&T (United States)), W. K. Waskiewicz(AT&T (United States)), P. P. Mulgrew(AT&T (United States)), Linus A. Fetter, D. L. Windt(AT&T (United States)), L. R. Harriott(AT&T (United States)), Alastair A. MacDowell(AT&T (United States))

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

November 1, 1992

10.1116/1.585943

Cited by 11

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