Influence of oxide hard mask on profiles of sub-100 nm Si and SiGe gates
Denis Shamiryan(IMEC), S. Vanhaelemeersch(Imec the Netherlands), Werner Boullart(IMEC), S. Locorotondo(IMEC), Vasile Paraschiv(IMEC), S. Beckx(Imec the Netherlands)
Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena
September 1, 2005
Cited by 2
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