Low-temperature Ge and GeSn Chemical Vapor Deposition using Ge2H6
Federica Gencarelli(IMEC), Marc Heyns(IMEC), Wilfried Vandervorst(Imec the Netherlands), Matty Caymax(IMEC), Laurent Souriau(IMEC), Olivier Richard(IMEC), Benjamin Vincent(IMEC), Roger Loo(IMEC)
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