Effective reduction of interfacial traps in Al2O3/GaAs (001) gate stacks using surface engineering and thermal annealing
Yen‐Chung Chang(National Tsing Hua University), M. Hong, Matty Caymax(IMEC), Marc Heyns(IMEC), J. Dekoster(IMEC), J. Kwo(National Tsing Hua University), J. Penaud(Fraunhofer Institute for Nondestructive Testing), Marc Meuris(IMEC), Wenlei Wang(IMEC), Chun‐An Lu(KU Leuven), Clément Merckling(IMEC)
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