Low temperature deposition of 2D WS <sub>2</sub> layers from WF <sub>6</sub> and H <sub>2</sub> S precursors: impact of reducing agents
Annelies Delabie(IMEC), Aaron Thean(National University of Singapore), Thomas Nuytten(IMEC), Benjamin Groven(IMEC), Karel Haesevoets(IMEC), Iuliana Radu(IMEC), Thierry Conard(IMEC), Matty Caymax(IMEC), Marc Heyns(IMEC), Stefan De Gendt(Imec the Netherlands), H. Bender(IMEC), Markus Heyne(IMEC), Sven Van Elshocht(Columbia University), Johan Meersschaut(IMEC), K. Barla(IMEC), Patrick Verdonck(Material (Belgium))
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