Profile control of novel non-Si gates using BCl3∕N2 plasma
Denis Shamiryan(IMEC), Werner Boullart(IMEC), Salvador Eslava(Imperial College London), M. Demand(IMEC), S. Beckx(Imec the Netherlands), Vasile Paraschiv(IMEC), Mikhaı̈l R. Baklanov(MIREA - Russian Technological University)
Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena
April 20, 2007
Cited by 10
Related Papers
Low-Loss SOI Photonic Wires and Ring Resonators Fabricated With Deep UV Lithography
|IEEE Photonics Technology Letters|2004|430
Compact Wavelength-Selective Functions in Silicon-on-Insulator Photonic Wires
|IEEE Journal of Selected Topics in Quantum Electronics|2006|338
Fabrication of photonic crystals in silicon-on-insulator using 248-nm deep UV lithography
|IEEE Journal of Selected Topics in Quantum Electronics|2002|164
Role of cobalt–iron (oxy)hydroxide (CoFeO<sub>x</sub>) as oxygen evolution catalyst on hematite photoanodes
|Energy & Environmental Science|2018|147