Impact of HfO<sub>2</sub> Dielectric Layer Placement in Hf<sub>0.5</sub>Zr<sub>0.5</sub>O<sub>2</sub>‐Based Ferroelectric Tunnel Junctions for Neuromorphic Applications
J. Kim(Dongguk University), Sungjun Kim(Dongguk University), Yongjin Park(Dongguk University), Jung Woo Lee(Dongguk University), Eunjin Lim(Dongguk University)
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