Overall reaction mechanism for a full atomic layer deposition cycle of W films on TiN surfaces: first-principles study
Hwanyeol Park(Soonchunhyang University), Gun‐Do Lee(University of Seoul), Daekwang Woo(Samsung (South Korea)), Ho Jun Kim(Soonchunhyang University), Sung‐Woo Lee(University of Seoul), Euijoon Yoon(Seoul National University), Jong Myeong Lee(Hanyang University)
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