Overall reaction mechanism for a full atomic layer deposition cycle of W films on TiN surfaces: first-principles study
Hwanyeol Park(Hanyang University), Gun‐Do Lee(Seoul National University), Daekwang Woo(Samsung (South Korea)), Ho Jun Kim(Hanyang University), Sung‐Woo Lee(Chonnam National University Hwasun Hospital), Euijoon Yoon(Seoul National University), Jong Myeong Lee(Hanyang University)
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