Bonding structure and etching characteristics of amorphous carbon for a hardmask deposited by DC sputtering
Soyeon Lee(Seoul National University), Young‐Chang Joo(University of Seoul), Hwanyeol Park(Soonchunhyang University), Sung‐Tae Kim(Seoul National University), Miyoung Kim(Seoul National University), Minwoo Jeong(Seoul National University), Gun‐Do Lee(University of Seoul), Kyung-Tae Jang(Seoul National University), Kuntae Kim(Seoul National University)
Cited by 25
Related Papers
Structural-relaxation-driven electron doping of amorphous oxide semiconductors by increasing the concentration of oxygen vacancies in shallow-donor states
|NPG Asia Materials|2016|64
Data driven computational design of stable oxygen evolution catalysts by DFT and machine learning: Promising electrocatalysts
|Journal of Energy Chemistry|2024|59
Spectroscopic capture of a low-spin Mn(IV)-oxo species in Ni–Mn3O4 nanoparticles during water oxidation catalysis
|Nature Communications|2020|57
Enhanced selectivity of atomic layer deposited Ru thin films through the discrete feeding of aminosilane inhibitor molecules
|Applied Surface Science|2020|37
Predictive fabrication of Ni phosphide embedded in carbon nanofibers as active and stable electrocatalysts
|Journal of Materials Chemistry A|2019|29