Bonding structure and etching characteristics of amorphous carbon for a hardmask deposited by DC sputtering
Soyeon Lee(Seoul National University), Young‐Chang Joo(Seoul National University), Hwanyeol Park(Hanyang University), Sung‐Tae Kim(Seoul National University), Miyoung Kim(University Dermatology), Minwoo Jeong(Seoul National University), Gun‐Do Lee(Seoul National University), Kyung-Tae Jang(Seoul National University), Kuntae Kim(Seoul National University)
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