Ferroelectric Al:HfO<inf>2</inf> negative capacitance FETs
M. H. Lee(National Taiwan Normal University), C. W. Liu(Taichung Veterans General Hospital), K.-T. Chen(National Taiwan University), Shih‐Yao Chen(Chung Hwa University of Medical Technology), C.-Y. Liao(National Taiwan Normal University), H.-H. Chen(National Taiwan Normal University), Cheng Tang(Queensland University of Technology), Z.-Y. Wang(National Taiwan Normal University), P.-G. Chen(National Taiwan Normal University), Y. C. Chou(National Taiwan Normal University), Chin‐Guo Kuo(National Taiwan Normal University), Sheng-Ting Fan(National Taiwan Normal University), S. T. Chang(National Taiwan University), S.-S. Gu(National Taiwan Normal University), K.-S. Li(National Chung Hsing University), R.-C. Hong(National Taiwan Normal University), Ming-Han Liao(National Chung Hsing University)
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