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Ferroelectric Al:HfO<inf>2</inf> negative capacitance FETsM. H. Lee, C. W. Liu, P.-G. Chen et al.|Unknown|2017Cited by 42
Ferroelectric Characteristics of Ultra-thin Hf<inf>1-x</inf>Zr<inf>x</inf>O<inf>2</inf> Gate Stack and 1T Memory Operation ApplicationsM. H. Lee, K.-S. Li, Chin‐Guo Kuo et al.|Unknown|2018Cited by 1
Steep switch-off of In0.18Al0.82N/AlN/GaN on Si MIS-HEMTP.-G. Chen, M. H. Lee, Y. C. Chou et al.|Unknown|2018Cited by 0