Ferroelectric Al:HfO<inf>2</inf> negative capacitance FETsM. H. Lee, C. W. Liu, Chin‐Guo Kuo et al.|Unknown|2017Cited by 42
Ferroelectric Characteristics of Ultra-thin Hf<inf>1-x</inf>Zr<inf>x</inf>O<inf>2</inf> Gate Stack and 1T Memory Operation ApplicationsM. H. Lee, K.-S. Li, Chin‐Guo Kuo et al.|Unknown|2018Cited by 1