Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
Benjamin Groven(IMEC), Annelies Delabie(IMEC), Patrick Verdonck(Material (Belgium)), Thomas Nuytten(IMEC), Quentin Smets(IMEC), Iuliana Radu(IMEC), Thierry Conard(IMEC), Wilfried Vandervorst(Imec the Netherlands), Matty Caymax(IMEC), Marc Heyns(IMEC), Alexis Franquet(IMEC), Ankit Nalin Mehta(IMEC), H. Bender(IMEC), Johan Meersschaut(IMEC)
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
November 16, 2017
Cited by 42
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