Printability of substrate and absorber defects on extreme ultraviolet lithographic masks

K. B. Nguyen(Sandia National Laboratories California), David L. Windt(Reflective X Ray Optics), Kevin D. Krenz(Sandia National Laboratories California), Linus A. Fetter, A. K. Raychaudhuri(Indian Institute of Science Bangalore), R. H. Stulen(Sandia National Laboratories California), D. M. Tennant(University of Tennessee at Knoxville)
Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena
November 1, 1995
10.1116/1.588327
Cited by 11

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